. Regeneration of silica gel after adsorption of organic impurities (1) Roasting method: For coarse-pored silica gel, it can be gradually heated to 500--600 °C in a roasting furnace, and it will take about 6-8 hours until the colloidal particles are whit. Regeneration of silica gel after adsorption of organic impurities
(1) Roasting method: For coarse-pored silica gel, it can be gradually heated to 500--600 °C in a roasting furnace, and it will take about 6-8 hours until the colloidal particles are white or yellowish-brown. For fine-pored silica gel, the calcination temperature should not exceed 200°C.
e or yellowish-brown. For fine-pored silica gel, the calcination temperature should not exceed 200°C.
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